The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the ...
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The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.
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Add this copy of Microelectronic Materials and Processes (Nato Science to cart. $16.77, good condition, Sold by HPB-Red rated 5.0 out of 5 stars, ships from Dallas, TX, UNITED STATES, published 1989 by Springer.
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Add this copy of Microelectronic Materials and Processes (Nato Science to cart. $59.57, very good condition, Sold by Books From California rated 4.0 out of 5 stars, ships from Simi Valley, CA, UNITED STATES, published 1989 by Springer.
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Good. No dust jacket. some shelf wear, p/o name inside cover, clean and tight copy otherwise. Sewn binding. Cloth over boards. 1000 p. Contains: Unspecified. NATO Science Series E: , 164. Audience: General/trade.
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UsedVeryGood. Hardcover; Proceedings of the NATO Advanced Study Institute on Microelectro nic Materials and Processes, held in Il Ciocco, Castelvecchio Pascoli, Ital y, June 30-July 11, 1986. Light fading, scuffing, and shelf wear to exterio r; former owner's stamping on front endpaper and copyright page; fade spots to endpapers and page edges; in very good condition with clean text, firm binding. No dust jacket.
Add this copy of Microelectronic Materials and Processes to cart. $562.70, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 1989 by Springer.
Add this copy of Microelectronic Materials and Processes to cart. $562.70, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 1989 by Springer.
Add this copy of Microelectronic Materials and Processes to cart. $615.80, new condition, Sold by Ria Christie Books rated 5.0 out of 5 stars, ships from Uxbridge, MIDDLESEX, UNITED KINGDOM, published 1989 by Springer.
Add this copy of Microelectronic Materials and Processes to cart. $650.15, new condition, Sold by Ria Christie Books rated 5.0 out of 5 stars, ships from Uxbridge, MIDDLESEX, UNITED KINGDOM, published 1989 by Springer.
