This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
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This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
Read Less
Add this copy of Plasma Etching: Fundamentals and Applications to cart. $240.02, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 1998 by Oxford University Press, USA.
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Seller's Description:
New. Print on demand Sewn binding. Cloth over boards. 356 p. Contains: Unspecified. Semiconductor Science and Technology, 7. Intended for a juvenile audience.
