The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Read Less
Add this copy of Plasma Etching: Fundamentals and Applications to cart. $240.02, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 1998 by Oxford University Press, USA.
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Seller's Description:
New. Print on demand Sewn binding. Cloth over boards. 356 p. Contains: Unspecified. Semiconductor Science and Technology, 7. Intended for a juvenile audience.
